Private One-on-One Workshops - One Day Ilford ULF object distance and image window

object distance and image window are hardly altered

The ARCA-SWISS C1 cube with its unique patented design makes possible

A panorama at the base of the tripod head serves to align the camera/recording instrument to the object

Innovative design Specifications:

back & Bellows

Private One-on-One Workshops - One Day Ilford ULF object distance and image windowPrivate One on One Workshops One Day These workshops are custom designed around what you would like to learn. Whether it is digital or large format, black & white or color we will work at your pace and cover the material you would like to learn, either in my studio or at a particular location you would like to photograph. Workshops can be one day or multiple days depending upon what you would like to accomplish. Please feel free to call me with any